Characterization of line-edge roughness in resist patterns and estimations of its effect on device performance

Yamaguchi, Atsuko; Tsuchiya, Ryuta; Fukuda, Hiroshi; Komuro, Osamu; Kawada, Hiroki; Iizumi, Takashi

doi:10.1117/12.483519

Record: found
Abstract: not found
Conference Proceedings: not found

Characterization of line-edge roughness in resist patterns and estimations of its effect on device performance

proceedings-article

Author(s): Atsuko Yamaguchi , Ryuta Tsuchiya , Hiroshi Fukuda , Osamu Komuro , Hiroki Kawada , Takashi Iizumi

Editor(s): Daniel J. Herr

Publication date (Online): June 2 2003

Conference name: Microlithography 2003

Conference date: Sunday 23 February 2003

Read this article at

ScienceOpenPublisher

Bookmark

There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.

Related collections

Author and article information

Conference

Publication date (Online): June 2 2003

Publication date (Print): May 27 2003

Page: 689

Article

DOI: 10.1117/12.483519

SO-VID: a6110aeb-e8e3-4ed7-86bc-66f3f598a0bd

Conference name: Microlithography 2003

Conference location: Santa Clara, CA

Conference date: Sunday 23 February 2003

History

ScienceOpen disciplines: Biochemistry,Animal science & Zoology

Data availability:

ScienceOpen disciplines: Biochemistry, Animal science & Zoology

Characterization of line-edge roughness in resist patterns and estimations of its effect on device performance

Read this article at

Related collections

Genome Integrity

Author and article information

Conference

Article

History

Comments

Comment on this article

Similar content 1,947

Cited by 3