Kristjan Kalam , 1 , Helina Seemen 1 , Peeter Ritslaid 1 , Mihkel Rähn 1 , Aile Tamm 1 , Kaupo Kukli 1 , 2 , Aarne Kasikov 1 , Joosep Link 3 , Raivo Stern 3 , Salvador Dueñas 4 , Helena Castán 4 , Héctor García 4
10 January 2018
Thin solid films consisting of ZrO 2 and Fe 2O 3 were grown by atomic layer deposition (ALD) at 400 °C. Metastable phases of ZrO 2 were stabilized by Fe 2O 3 doping. The number of alternating ZrO 2 and Fe 2O 3 deposition cycles were varied in order to achieve films with different cation ratios. The influence of annealing on the composition and structure of the thin films was investigated. Additionally, the influence of composition and structure on electrical and magnetic properties was studied. Several samples exhibited a measurable saturation magnetization and most of the samples exhibited a charge polarization. Both phenomena were observed in the sample with a Zr/Fe atomic ratio of 2.0.