22
views
0
recommends
+1 Recommend
0 collections
    0
    shares
      • Record: found
      • Abstract: found
      • Article: found
      Is Open Access

      Correlated charged impurity scattering in graphene

      Preprint
      ,

      Read this article at

      Bookmark
          There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.

          Abstract

          Understanding disorder in graphene is essential for electronic applications; in contrast to conventional materials, the extraordinarily low electron-phonon scattering1, 2 in graphene implies that disorder3-7 dominates its resistivity even at room temperature. Charged impurities5, 8-10 have been identified as an important disorder type in graphene on SiO2 substrates11, 12, giving a nearly linear carrier-density-dependent conductivity {\sigma}(n), and producing electron and hole puddles13-15 which determine the magnitude of graphene's minimum conductivity {\sigma}min10. Correlations of charged impurities are known to be essential in achieving the highest mobilities in remotely-doped semiconductor heterostructures16-18, and are present to some degree in any impurity system at finite temperature. Here we show that even modest correlations in the position of charged impurities, realized by annealing potassium on graphene, can increase the mobility by more than a factor of four. The results are well understood theoretically19 considering an impurity correlation length which is temperature dependent but independent of impurity density. Impurity correlations also naturally explain the sub-linear {\sigma}(n) commonly observed in substrate-bound graphene devices2, 11, 12, 20.

          Related collections

          Most cited references24

          • Record: found
          • Abstract: found
          • Article: found
          Is Open Access

          Boron nitride substrates for high-quality graphene electronics

          Graphene devices on standard SiO2 substrates are highly disordered, exhibiting characteristics far inferior to the expected intrinsic properties of graphene[1-12]. While suspending graphene above the substrate yields substantial improvement in device quality[13,14], this geometry imposes severe limitations on device architecture and functionality. Realization of suspended-like sample quality in a substrate supported geometry is essential to the future progress of graphene technology. In this Letter, we report the fabrication and characterization of high quality exfoliated mono- and bilayer graphene (MLG and BLG) devices on single crystal hexagonal boron nitride (h-BN) substrates, by a mechanical transfer process. Variable-temperature magnetotransport measurements demonstrate that graphene devices on h-BN exhibit enhanced mobility, reduced carrier inhomogeneity, and reduced intrinsic doping in comparison with SiO2-supported devices. The ability to assemble crystalline layered materials in a controlled way sets the stage for new advancements in graphene electronics and enables realization of more complex graphene heterostructres.
            Bookmark
            • Record: found
            • Abstract: found
            • Article: found
            Is Open Access

            Giant Intrinsic Carrier Mobilities in Graphene and Its Bilayer

            We have studied temperature dependences of electron transport in graphene and its bilayer and found extremely low electron-phonon scattering rates that set the fundamental limit on possible charge carrier mobilities at room temperature. Our measurements have shown that mobilities significantly higher than 200,000 cm2/Vs are achievable, if extrinsic disorder is eliminated. A sharp (threshold-like) increase in resistivity observed above approximately 200K is unexpected but can qualitatively be understood within a model of a rippled graphene sheet in which scattering occurs on intra-ripple flexural phonons.
              Bookmark
              • Record: found
              • Abstract: found
              • Article: found
              Is Open Access

              Intrinsic and Extrinsic Performance Limits of Graphene Devices on SiO2

              The linear dispersion relation in graphene[1,2] gives rise to a surprising prediction: the resistivity due to isotropic scatterers (e.g. white-noise disorder[3] or phonons[4-8]) is independent of carrier density n. Here we show that acoustic phonon scattering[4-6] is indeed independent of n, and places an intrinsic limit on the resistivity in graphene of only 30 Ohm at room temperature (RT). At a technologically-relevant carrier density of 10^12 cm^-2, the mean free path for electron-acoustic phonon scattering is >2 microns, and the intrinsic mobility limit is 2x10^5 cm^2/Vs, exceeding the highest known inorganic semiconductor (InSb, ~7.7x10^4 cm^2/Vs[9]) and semiconducting carbon nanotubes (~1x10^5 cm^2/Vs[10]). We also show that extrinsic scattering by surface phonons of the SiO2 substrate[11,12] adds a strong temperature dependent resistivity above ~200 K[8], limiting the RT mobility to ~4x10^4 cm^2/Vs, pointing out the importance of substrate choice for graphene devices[13].
                Bookmark

                Author and article information

                Journal
                23 June 2011
                Article
                10.1103/PhysRevLett.107.206601
                1106.4835
                af66463a-4fda-4df3-923f-079aad124d6d

                http://arxiv.org/licenses/nonexclusive-distrib/1.0/

                History
                Custom metadata
                Phys. Rev. Lett. 107, 206601 (2011)
                24 pages
                cond-mat.mes-hall

                Comments

                Comment on this article