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      Calculation of changes in pattern dimensions to compensate for proximity effects in electron lithography

      Journal of Applied Physics
      AIP Publishing

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          Proximity effect in electron‐beam lithography

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            Energy dissipation in a thin polymer film by electron beam scattering

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              Energy deposition functions in electron resist films on substrates

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                Author and article information

                Journal
                Journal of Applied Physics
                Journal of Applied Physics
                AIP Publishing
                0021-8979
                1089-7550
                January 1980
                January 1980
                : 51
                : 1
                : 705-709
                Article
                10.1063/1.327329
                b013fc8f-b4fe-49db-aa34-ec0955e00a97
                © 1980
                History

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