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3,991
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Calculation of changes in pattern dimensions to compensate for proximity effects in electron lithography
Author(s):
Mihir Parikh
Publication date
Created:
January 1980
Publication date
(Print):
January 1980
Journal:
Journal of Applied Physics
Publisher:
AIP Publishing
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Scholarly Publication Practices and Impact Factor Calculation and Manipulation
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7
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Proximity effect in electron‐beam lithography
T. H. P. Chang
(1975)
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Energy dissipation in a thin polymer film by electron beam scattering
R. Hawryluk
,
Andrew Hawryluk
,
Henry Smith
(1974)
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Energy deposition functions in electron resist films on substrates
David Kyser
,
Mihir Parikh
(1979)
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Author and article information
Journal
Title:
Journal of Applied Physics
Abbreviated Title:
Journal of Applied Physics
Publisher:
AIP Publishing
ISSN (Print):
0021-8979
ISSN (Electronic):
1089-7550
Publication date Created:
January 1980
Publication date (Print):
January 1980
Volume
: 51
Issue
: 1
Pages
: 705-709
Article
DOI:
10.1063/1.327329
SO-VID:
b013fc8f-b4fe-49db-aa34-ec0955e00a97
Copyright ©
© 1980
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