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      In-chip microstructures and photonic devices fabricated by nonlinear laser lithography deep inside silicon

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          Abstract

          Silicon is an excellent material for microelectronics and integrated photonics 13 with untapped potential for mid-IR optics 4. Despite broad recognition of the importance of the third dimension 5, 6, current lithography methods do not allow fabrication of photonic devices and functional microelements directly inside silicon chips. Even relatively simple curved geometries cannot be realised with techniques like reactive ion etching. Embedded optical elements, like in glass 7, electronic devices, and better electronic-photonic integration are lacking 8. Here, we demonstrate laser-based fabrication of complex 3D structures deep inside silicon using 1 µm-sized dots and rod-like structures of adjustable length as basic building blocks. The laser-modified Si has a different optical index than unmodified parts, which enables numerous photonic devices. Optionally, these parts are chemically etched to produce desired 3D shapes. We exemplify a plethora of subsurface, i.e., “ in-chip” microstructures for microfluidic cooling of chips, vias, MEMS, photovoltaic applications and photonic devices that match or surpass the corresponding state-of-the-art device performances.

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          Most cited references28

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          Printing soft matter in three dimensions.

          Light- and ink-based three-dimensional (3D) printing methods allow the rapid design and fabrication of materials without the need for expensive tooling, dies or lithographic masks. They have led to an era of manufacturing in which computers can control the fabrication of soft matter that has tunable mechanical, electrical and other functional properties. The expanding range of printable materials, coupled with the ability to programmably control their composition and architecture across various length scales, is driving innovation in myriad applications. This is illustrated by examples of biologically inspired composites, shape-morphing systems, soft sensors and robotics that only additive manufacturing can produce.
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            Optically reconfigurable metasurfaces and photonic devices based on phase change materials

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              Large-scale nanophotonic phased array.

              Electromagnetic phased arrays at radio frequencies are well known and have enabled applications ranging from communications to radar, broadcasting and astronomy. The ability to generate arbitrary radiation patterns with large-scale phased arrays has long been pursued. Although it is extremely expensive and cumbersome to deploy large-scale radiofrequency phased arrays, optical phased arrays have a unique advantage in that the much shorter optical wavelength holds promise for large-scale integration. However, the short optical wavelength also imposes stringent requirements on fabrication. As a consequence, although optical phased arrays have been studied with various platforms and recently with chip-scale nanophotonics, all of the demonstrations so far are restricted to one-dimensional or small-scale two-dimensional arrays. Here we report the demonstration of a large-scale two-dimensional nanophotonic phased array (NPA), in which 64 × 64 (4,096) optical nanoantennas are densely integrated on a silicon chip within a footprint of 576 μm × 576 μm with all of the nanoantennas precisely balanced in power and aligned in phase to generate a designed, sophisticated radiation pattern in the far field. We also show that active phase tunability can be realized in the proposed NPA by demonstrating dynamic beam steering and shaping with an 8 × 8 array. This work demonstrates that a robust design, together with state-of-the-art complementary metal-oxide-semiconductor technology, allows large-scale NPAs to be implemented on compact and inexpensive nanophotonic chips. In turn, this enables arbitrary radiation pattern generation using NPAs and therefore extends the functionalities of phased arrays beyond conventional beam focusing and steering, opening up possibilities for large-scale deployment in applications such as communication, laser detection and ranging, three-dimensional holography and biomedical sciences, to name just a few.
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                Author and article information

                Journal
                101283276
                34862
                Nat Photonics
                Nat Photonics
                Nature photonics
                1749-4885
                1749-4893
                7 September 2017
                29 September 2017
                October 2017
                29 March 2018
                : 11
                : 10
                : 639-645
                Affiliations
                [1 ]Department of Physics, Bilkent University, Ankara, 06800, Turkey
                [2 ]Department of Electrical and Electronics Engineering, Bilkent University, Ankara, 06800, Turkey
                [3 ]The Center for Solar Energy Research and Applications, Middle East Technical University, Ankara, 06800, Turkey
                [4 ]Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, Massachusetts, 02139, USA
                [5 ]Helmholtz-Zentrum Dresden - Rossendorf, Institute of Ion Beam Physics and Materials Research, Bautzner Landstraße 400, 01328 Dresden, Germany
                [6 ]Micro and Nanotechnology Graduate Program, Middle East Technical University, Ankara, 06800, Turkey
                [7 ]Department of Physics, Middle East Technical University, Ankara, 06800, Turkey
                [8 ]Harvard Medical School, Boston, MA, 02115, USA
                [9 ]UNAM – National Nanotechnology Research Center and Institute of Materials Science and Nanotechnology, Bilkent University, Ankara, 06800, Turkey
                Author notes
                []To whom correspondence should be addressed: otokel@ 123456bilkent.edu.tr
                [†]

                Present address: Izmir International Biomedicine and Genome Institute, Izmir, 35340, Turkey

                Article
                EMS73534
                10.1038/s41566-017-0004-4
                5624509
                28983323
                b1d55ece-9af8-4a12-b63b-907e9845591d

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                Optical materials & Optics
                Optical materials & Optics

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