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      Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered cathodic arc/unbalanced magnetron technique

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      Thin Solid Films

      Elsevier BV

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          Most cited references 23

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          A novel pulsed magnetron sputter technique utilizing very high target power densities

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            Microstructural evolution during film growth

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              Influence of high power densities on the composition of pulsed magnetron plasmas

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                Author and article information

                Journal
                Thin Solid Films
                Thin Solid Films
                Elsevier BV
                00406090
                June 2004
                June 2004
                : 457
                : 2
                : 270-277
                Article
                10.1016/j.tsf.2003.11.113
                © 2004

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