Influence of image processing on line-edge roughness in CD-SEM measurement

Yamaguchi, Atsuko; Yamamoto, Jiro

doi:10.1117/12.775664

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Influence of image processing on line-edge roughness in CD-SEM measurement

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Author(s): Atsuko Yamaguchi , Jiro Yamamoto

Editor(s): John A. Allgair , Christopher J. Raymond

Publication date (Online): April 28 2008

Conference name: SPIE Advanced Lithography

Conference date: Sunday 24 February 2008

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Publication date (Online): April 28 2008

Publication date (Print): March 14 2008

Page: 692221

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DOI: 10.1117/12.775664

SO-VID: bc8459fc-d2d2-4546-921b-f395df897a75

Conference name: SPIE Advanced Lithography

Conference location: San Jose, California, USA

Conference date: Sunday 24 February 2008

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ScienceOpen disciplines: Biochemistry,Animal science & Zoology

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ScienceOpen disciplines: Biochemistry, Animal science & Zoology

Influence of image processing on line-edge roughness in CD-SEM measurement

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