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      Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook

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          Atomic layer deposition: an overview.

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            Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

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              A brief review of atomic layer deposition: from fundamentals to applications

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                Author and article information

                Journal
                Journal of Vacuum Science & Technology A
                Journal of Vacuum Science & Technology A
                American Vacuum Society
                0734-2101
                1520-8559
                December 2019
                December 2019
                : 37
                : 6
                : 060904
                Affiliations
                [1 ]Department of Chemical and Biological Engineering, Colorado School of Mines, Golden, Colorado 80401
                [2 ]Tyndall National Institute, University College Cork, Cork T12 R5CP, Ireland
                [3 ]Schrödinger Inc., 120 West 45th Street, New York, New York 10036
                [4 ]Lam Research Corporation, Tualatin, Oregon 97062
                Article
                10.1116/1.5113631
                bcb0b6a3-73c7-466a-bb87-8dafafaffba9
                © 2019
                History

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