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      Prepare dispersed CIS nano-scale particles and spray coating CIS absorber layers using nano-scale precursors

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          Abstract

          In this study, the Mo-electrode thin films were deposited by a two-stepped process, and the high-purity copper indium selenide-based powder (CuInSe 2, CIS) was fabricated by hydrothermal process by Nanowin Technology Co. Ltd. From the X-ray pattern of the CIS precursor, the mainly crystalline phase was CIS, and the almost undetectable CuSe phase was observed. Because the CIS powder was aggregated into micro-scale particles and the average particle sizes were approximately 3 to 8 μm, the CIS power was ground into nano-scale particles, then the 6 wt.% CIS particles were dispersed into isopropyl alcohol to get the solution for spray coating method. Then, 0.1 ml CIS solution was sprayed on the 20 mm × 10 mm Mo/glass substrates, and the heat treatment for the nano-scale CIS solution under various parameters was carried out in a selenization furnace. The annealing temperature was set at 550°C, and the annealing time was changed from 5 to 30 min, without extra Se content was added in the furnace. The influences of annealing time on the densification, crystallization, resistivity ( ρ), hall mobility ( μ), and carrier concentration of the CIS absorber layers were well investigated in this study.

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          High quality baseline for high efficiency, Cu(In1−x,Gax)Se2 solar cells

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            Substrate temperature dependence of electrical properties of ZnO:Al epitaxial films on sapphire (12̄10)

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              Investigation of the properties of nanostructured Li-doped NiO films using the modified spray pyrolysis method

              The lithium-doped nickel oxide (L-NiO) films were synthetized using the modified spray pyrolysis method with a two-step grown process. By observing the spectra of X-ray photoemission spectroscopy of L-NiO films, the intensity of Ni 2p 3/2 peak of Ni3+ bonding state increases with increasing Li concentration that causes the decrease of transparency and resistivity. The L-NiO films with optimum characteristics were obtained at Li = 8 at%, where a p-type resistivity of 4.1 × 10−1 Ω cm and optical transparency above 76% in the visible region are achieved.
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                Author and article information

                Journal
                Nanoscale Res Lett
                Nanoscale Res Lett
                Nanoscale Research Letters
                Springer
                1931-7573
                1556-276X
                2014
                1 January 2014
                : 9
                : 1
                : 1
                Affiliations
                [1 ]Electronics and Optoelectronics Research Laboratories, Industrial Technology Research Institute, Hsinchu 31040, Taiwan
                [2 ]Department of Electronic Engineering, Kao Yuan University, Kaohsiung 82151, Taiwan
                [3 ]Department of Applied Materials and Optoelectronic Engineering, National Chi Nan University, Puli 54561, Taiwan
                [4 ]Department of Chemical and Materials Engineering, National University of Kaohsiung, Kaohsiung 82151, Taiwan
                Article
                1556-276X-9-1
                10.1186/1556-276X-9-1
                3895740
                24380376
                bf060ae5-c505-4a5c-bbe6-200c70472b23
                Copyright © 2014 Liou et al.; licensee Springer.

                This is an Open Access article distributed under the terms of the Creative Commons Attribution License ( http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

                History
                : 31 October 2013
                : 27 November 2013
                Categories
                Nano Express

                Nanomaterials
                cis absorber layer,nano-scale particle,annealing,spray coating method
                Nanomaterials
                cis absorber layer, nano-scale particle, annealing, spray coating method

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