ScienceOpen:
research and publishing network
For Publishers
Discovery
Metadata
Peer review
Hosting
Publishing
For Researchers
Join
Publish
Review
Collect
My ScienceOpen
Sign in
Register
Dashboard
Blog
About
Search
Advanced search
My ScienceOpen
Sign in
Register
Dashboard
Search
Search
Advanced search
For Publishers
Discovery
Metadata
Peer review
Hosting
Publishing
For Researchers
Join
Publish
Review
Collect
Blog
About
4
views
7
references
Top references
cited by
26
Cite as...
0 reviews
Review
0
comments
Comment
0
recommends
+1
Recommend
0
collections
Add to
0
shares
Share
Twitter
Sina Weibo
Facebook
Email
2,436
similar
All similar
Record
: found
Abstract
: not found
Article
: not found
Charge trapping properties of the HfO2 layer with various thicknesses for charge trap flash memory applications
Author(s):
Hee-Wook You
,
Won-Ju Cho
Publication date
Created:
March 2010
Publication date
(Print):
March 2010
Journal:
Applied Physics Letters
Publisher:
AIP Publishing
Read this article at
ScienceOpen
Publisher
Review
Review article
Invite someone to review
Bookmark
Cite as...
There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.
Related collections
Embodied Memory
Most cited references
7
Record
: found
Abstract
: not found
Article
: not found
Review on high-k dielectrics reliability issues
M. Denais
,
S. Bruyère
,
G Ghibaudo
…
(2005)
0
comments
Cited
41
times
– based on
0
reviews
Review now
Bookmark
Record
: found
Abstract
: not found
Article
: not found
Charge trapping characteristics of atomic-layer-deposited HfO2 films with Al2O3 as a blocking oxide for high-density non-volatile memory device applications
P.-J. Tzeng
,
S. Maikap
,
H. Y. Lee
…
(2007)
0
comments
Cited
32
times
– based on
0
reviews
Review now
Bookmark
Record
: found
Abstract
: not found
Article
: not found
Design considerations in scaled SONOS nonvolatile memory devices
Jiankang Bu
,
Marvin H White
(2001)
0
comments
Cited
22
times
– based on
0
reviews
Review now
Bookmark
All references
Author and article information
Journal
Title:
Applied Physics Letters
Abbreviated Title:
Appl. Phys. Lett.
Publisher:
AIP Publishing
ISSN (Print):
0003-6951
ISSN (Electronic):
1077-3118
Publication date Created:
March 2010
Publication date (Print):
March 2010
Volume
: 96
Issue
: 9
Page
: 093506
Article
DOI:
10.1063/1.3337103
SO-VID:
c1527283-626a-41f8-be54-0a7c2c277814
Copyright ©
© 2010
History
Data availability:
Comments
Comment on this article
Sign in to comment
scite_
Similar content
2,436
Oxidation performance of Si-HfO2 environmental barrier coating bond coats deposited via plasma spray-physical vapor deposition
Authors:
Christopher Harder
,
BJ Harder
,
Bryan Harder
Growth of (111)-oriented epitaxial and textured ferroelectric Y-doped HfO2 films for downscaled devices
Authors:
Hiroshi Funakubo
,
Hiroshi Uchida
,
Toyohiko Konno
…
Analysis of Conduction and Charging Mechanisms in Atomic Layer Deposited Multilayered HfO2/Al2O3 Stacks for Use in Charge Trapping Flash Memories
Authors:
Nenad Novkovski
,
Dencho Spassov
,
Aleksandar Skeparovski
…
See all similar
Cited by
26
Review on Non-Volatile Memory with High-k Dielectrics: Flash for Generation Beyond 32 nm
Authors:
Chun Zhao
,
Ce Zhou Zhao
,
Stephen Taylor
…
Memristive Devices Based on Two-Dimensional Transition Metal Chalcogenides for Neuromorphic Computing
Authors:
Ki Chang Kwon
,
Ji Baek
,
Kootak Hong
…
Silicon doped hafnium oxide (HSO) and hafnium zirconium oxide (HZO) based FeFET: A material relation to device physics
Authors:
X. Thrun
,
T. Ali
,
P. Polakowski
…
See all cited by
Most referenced authors
87
Y. Wang
K Liu
R Yang
See all reference authors