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      Latent image formation in chemically amplified extreme ultraviolet resists with low activation energy for deprotection reaction

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          Shot noise, LER, and quantum efficiency of EUV photoresists

          R. Mackay, Peter Trefonas, Jeroen H. Lammers … (2004)
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            Development of Positive Photoresists

            Chris Mack (1987)
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              Resist blur and line edge roughness (Invited Paper)

              Gregg M. Gallatin, Bruce W. Smith (2005)
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                Author and article information

                Journal
                Journal ID (publisher-id): JVTBD9
                Title: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
                Abbreviated Title: J. Vac. Sci. Technol. B
                Publisher: American Vacuum Society
                ISSN (Print): 1071-1023
                ISSN (Electronic): 1520-8567
                Publication date Created: November 2008
                Publication date (Print): November 2008
                Volume: 26
                Issue: 6
                Pages: 2257-2260
                Affiliations
                [1 ]The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
                [2 ]Semiconductor Leading Edge Technologies, Inc., 16-1 Onogawa, Tsukuba, Ibaraki, 305-8569, Japan
                Article
                DOI: 10.1116/1.2990787
                SO-VID: ca322771-cc2a-441d-ad40-b4fce8e116c2
                Copyright © © 2008
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