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Fabrication of high aspect ratio symmetric and asymmetric T-shaped gates for high frequency pseudomorphic HEMTs
Author(s):
E. Lopez
,
A. Marten
,
A. Forchel
,
J.L. Caceres
,
H. Nickel
,
W. Schlapp
,
R. Lösch
Publication date
Created:
April 1990
Publication date
(Print):
April 1990
Journal:
Microelectronic Engineering
Publisher:
Elsevier BV
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There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.
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Digitizing Fabrication
Author and article information
Journal
Title:
Microelectronic Engineering
Abbreviated Title:
Microelectronic Engineering
Publisher:
Elsevier BV
ISSN (Print):
01679317
Publication date Created:
April 1990
Publication date (Print):
April 1990
Volume
: 11
Issue
: 1-4
Pages
: 105-108
Article
DOI:
10.1016/0167-9317(90)90082-5
SO-VID:
ca8a54f0-16d0-4d85-83df-7b2e079bbc6a
Copyright ©
© 1990
License:
http://www.elsevier.com/tdm/userlicense/1.0/
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