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      Properties of Fe‐Al‐Si‐N thin films prepared by N2reactive sputtering

      Author(s): , ,
      Publication date Created:
      Publication date (Print):
      Journal: Journal of Applied Physics
      Publisher: AIP Publishing

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          New Magnetic Material Having Ultrahigh Magnetic Moment

          T. Kim, M. Takahashi (1972)
          Article 0 comments Cited 134 times – based on 0 reviews     Review now
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            Metastable Fe nitrides with high Bsprepared by reactive sputtering

            H Fujimori, A. Kano*, N. Kazama … (1982)
            Article 0 comments Cited 21 times – based on 0 reviews     Review now
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              Effect of nitrogen on the crystal texture and microstructure of sputtered Ni‐Fe films

              A K Jhingan (1985)
              Article 0 comments Cited 4 times – based on 0 reviews     Review now
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                Author and article information

                Journal
                Title: Journal of Applied Physics
                Abbreviated Title: Journal of Applied Physics
                Publisher: AIP Publishing
                ISSN (Print): 0021-8979
                ISSN (Electronic): 1089-7550
                Publication date Created: April 15 1987
                Publication date (Print): April 15 1987
                Volume: 61
                Issue: 8
                Pages: 3844-3846
                Article
                DOI: 10.1063/1.338616
                SO-VID: cca4df23-c205-4f32-ac6f-4f0dcb2d9a9f
                Copyright © © 1987
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