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      Role of Oxygen for Boron Diffusion From Borosilicate Glass Layers Deposited by Atmospheric Pressure Chemical Vapor Deposition

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          General Relationship for the Thermal Oxidation of Silicon

          B. E. Deal, A. S. Grove (1965)
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            Improved quantitative description of Auger recombination in crystalline silicon

            Stefan W. Glunz, Florian Werner, Jan Schmidt … (2012)
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              Formation of stacking faults and enhanced diffusion in the oxidation of silicon

              S. M. Hu (1974)
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                Author and article information

                Journal
                Title: IEEE Journal of Photovoltaics
                Abbreviated Title: IEEE J. Photovoltaics
                Publisher: Institute of Electrical and Electronics Engineers (IEEE)
                ISSN (Print): 2156-3381
                ISSN (Electronic): 2156-3403
                Publication date Created: July 2018
                Publication date (Print): July 2018
                Volume: 8
                Issue: 4
                Pages: 982-989
                Article
                DOI: 10.1109/JPHOTOV.2018.2835445
                SO-VID: d4197923-8222-4e75-a9c2-ef2c5adc94ed
                Copyright © © 2018
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