Blog
About

  • Record: found
  • Abstract: not found
  • Article: not found

Application of high‐rate E×B or magnetron sputtering in the metallization of semiconductor devices

,

Journal of Vacuum Science and Technology

American Vacuum Society

Read this article at

ScienceOpenPublisher
Bookmark
      There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.

      Related collections

      Author and article information

      Journal
      Journal of Vacuum Science and Technology
      Journal of Vacuum Science and Technology
      American Vacuum Society
      0022-5355
      January 1976
      January 1976
      : 13
      : 1
      : 157-164
      10.1116/1.568813
      © 1976
      Product

      Comments

      Comment on this article