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      Utilisation of Cu(hfac)tmvs precursor gas in LCVD integrated circuit repair system

      , ,

      Applied Surface Science

      Elsevier BV

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          Journal
          Applied Surface Science
          Applied Surface Science
          Elsevier BV
          01694332
          January 1999
          January 1999
          : 138-139
          : 123-129
          Article
          10.1016/S0169-4332(98)00418-8
          © 1999

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