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Utilisation of Cu(hfac)tmvs precursor gas in LCVD integrated circuit repair system
Author(s):
Seppo Leppävuori
,
Janne Remes
,
Hannu Moilanen
Publication date
Created:
January 1999
Publication date
(Print):
January 1999
Journal:
Applied Surface Science
Publisher:
Elsevier BV
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Author and article information
Journal
Title:
Applied Surface Science
Abbreviated Title:
Applied Surface Science
Publisher:
Elsevier BV
ISSN (Print):
01694332
Publication date Created:
January 1999
Publication date (Print):
January 1999
Volume
: 138-139
Pages
: 123-129
Article
DOI:
10.1016/S0169-4332(98)00418-8
SO-VID:
e12c3469-e627-4584-a13b-47c99ff2a721
Copyright ©
© 1999
License:
https://www.elsevier.com/tdm/userlicense/1.0/
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