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Suboxide/subnitride formation on Ta masks during magnetic material etching by reactive plasmas
Author(s):
H. Li
,
Y Muraki
,
K. Karahashi
,
S Hamaguchi
Publication date:
2015
Journal:
J. Vac. Sci. Technol. A Vacuum, Surfaces, Film.
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DOI::
10.1116/1.4919925
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