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      All-Si Photodetectors with a Resonant Cavity for Near-Infrared Polarimetric Detection

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          Abstract

          This work developed an all-Si photodetector with a surface plasmonic resonator formed by a sub-wavelength Au grating on the top of a Si-nanowire array and the same one beside the wires. The Au/Si interface with a Schottky barrier allows the photo-electron detection in near-infrared wavelength based on the internal emission of hot electrons generated by the surface plasmons in the cavity. Meanwhile, the Au sub-wavelength grating on the Si nanowire array acts as a polarizer for polarimetric detection. Finite-difference time-domain method was applied in the design of the novel device and state-of-art nanofabrication based on electron beam lithography was carried out. The characterization of the photo-electronic properties as well as the polarimetric detection demonstrate that the fabricated detectors on the silicon substrate possesses great prospects for sensing technology on all-Si.

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          Most cited references30

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          Photodetection with active optical antennas.

          Nanoantennas are key optical components for light harvesting; photodiodes convert light into a current of electrons for photodetection. We show that these two distinct, independent functions can be combined into the same structure. Photons coupled into a metallic nanoantenna excite resonant plasmons, which decay into energetic, "hot" electrons injected over a potential barrier at the nanoantenna-semiconductor interface, resulting in a photocurrent. This dual-function structure is a highly compact, wavelength-resonant, and polarization-specific light detector, with a spectral response extending to energies well below the semiconductor band edge.
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            The Analysis of Photoelectric Sensitivity Curves for Clean Metals at Various Temperatures

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              Photogating in Low Dimensional Photodetectors

              Abstract Low dimensional materials including quantum dots, nanowires, 2D materials, and so forth have attracted increasing research interests for electronic and optoelectronic devices in recent years. Photogating, which is usually observed in photodetectors based on low dimensional materials and their hybrid structures, is demonstrated to play an important role. Photogating is considered as a way of conductance modulation through photoinduced gate voltage instead of simply and totally attributing it to trap states. This review first focuses on the gain of photogating and reveals the distinction from conventional photoconductive effect. The trap‐ and hybrid‐induced photogating including their origins, formations, and characteristics are subsequently discussed. Then, the recent progress on trap‐ and hybrid‐induced photogating in low dimensional photodetectors is elaborated. Though a high gain bandwidth product as high as 109 Hz is reported in several cases, a trade‐off between gain and bandwidth has to be made for this type of photogating. The general photogating is put forward according to another three reported studies very recently. General photogating may enable simultaneous high gain and high bandwidth, paving the way to explore novel high‐performance photodetectors.
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                Author and article information

                Contributors
                16110720010@fudan.edu.cn
                zhujingyuan_an_edu@outlook.com
                1551435560@qq.com
                jingwan@fudan.edu.cn
                ganzl@jihualab.com
                lubingrui@fudan.edu.cn
                yifangchen@fudan.edu.cn
                Journal
                Nanoscale Res Lett
                Nanoscale Res Lett
                Nanoscale Research Letters
                Springer US (New York )
                1931-7573
                1556-276X
                30 January 2019
                30 January 2019
                2019
                : 14
                : 39
                Affiliations
                [1 ]ISNI 0000 0001 0125 2443, GRID grid.8547.e, Fudan University, ; Shanghai, China
                [2 ]JiHua Laboratory, Foshan, China
                [3 ]ISNI 0000 0001 0125 2443, GRID grid.8547.e, Nanolithography and Application Research Group, State Key Lab of Asic and System, , Fudan University, ; Shanghai, China
                Author information
                http://orcid.org/0000-0002-1711-3146
                Article
                2868
                10.1186/s11671-019-2868-3
                6353983
                30701348
                e59a018d-2ec0-4935-b183-9a12a99b806f
                © The Author(s). 2019

                Open AccessThis article is distributed under the terms of the Creative Commons Attribution 4.0 International License ( http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.

                History
                : 20 November 2018
                : 14 January 2019
                Funding
                Funded by: The Basic Research Project of Shanghai Science and Technology Innovation Action
                Award ID: No. 17JC1400300
                Award Recipient :
                Funded by: FC2017-008
                Award ID: No. 61574043,No. U1732104
                Award Recipient :
                Categories
                Nano Express
                Custom metadata
                © The Author(s) 2019

                Nanomaterials
                all-si photodetector,internal emission of hot electrons,surface plasmonic resonator,polarimetric detection,nanofabrication

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