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      Significant Luminescence Enhancement of Ga-Doped WS 2 Monolayers Grown by CVD

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          Abstract

          Monolayer tungsten disulfide (WS 2) is a direct-band-gap semiconductor that has excellent luminescence properties, which are of great interest for optoelectronic applications. In this study, we investigated the effect of gallium (Ga) on WS 2 monolayers grown by chemical vapor deposition. Our results indicate that Ga-doped WS 2 exhibits a 3.6-fold increase in photoluminescence intensity for doped samples compared to pristine WS 2. To confirm the existence of Ga in the WS 2 structures, resonance Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) were utilized as characterization methods. A redshift of the XPS spectrum was observed as well as an increase in the disorder-related Raman modes, which were attributed to the influence of Ga. XPS analysis and ab initio electronic structure calculations reveal the presence of substitutional Ga atoms as well as Ga atoms adsorbed on WS 2 surfaces.

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          Efficient iterative schemes forab initiototal-energy calculations using a plane-wave basis set

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            Atomically Thin\({\mathrm{MoS}}_{2}\): A New Direct-Gap Semiconductor

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              The transition metal dichalcogenides discussion and interpretation of the observed optical, electrical and structural properties

                Author and article information

                Journal
                ACS Omega
                ACS Omega
                ao
                acsodf
                ACS Omega
                American Chemical Society
                2470-1343
                09 April 2025
                22 April 2025
                : 10
                : 15
                : 15663-15672
                Affiliations
                []Department of Physics, Pontifícia Universidade Católica do Rio de Janeiro , Rio de Janeiro 22451-900, Brazil
                []Laboratory of Surfaces and Nanostructures, Brazilian Center for Physics Research , Rio de Janeiro 22290-180, Brazil
                [§ ]Institute of Physics, Fluminense Federal University , Niteroi 24210-346, Brazil
                []Departamento de Ciencias, Sección Física, Pontificia Universidad Católica del Perú , Av. Universitaria 1801, Lima 32, Peru
                Author notes
                Author information
                https://orcid.org/0000-0002-1958-6967
                https://orcid.org/0000-0002-4166-2487
                Article
                10.1021/acsomega.5c01066
                12019728
                eef649b7-e322-420b-9163-9888b97918f2
                © 2025 The Authors. Published by American Chemical Society

                Permits the broadest form of re-use including for commercial purposes, provided that author attribution and integrity are maintained ( https://creativecommons.org/licenses/by/4.0/).

                History
                : 04 February 2025
                : 03 April 2025
                : 21 March 2025
                Funding
                Funded by: Coordenação de Aperfeiçoamento de Pessoal de Nível Superior, doi 10.13039/501100002322;
                Award ID: 001
                Funded by: Fundação Carlos Chagas Filho de Amparo à Pesquisa do Estado do Rio de Janeiro, doi 10.13039/501100004586;
                Award ID: E-26/210.006/2018
                Funded by: Fundação Carlos Chagas Filho de Amparo à Pesquisa do Estado do Rio de Janeiro, doi 10.13039/501100004586;
                Award ID: E-26/204.217/2021
                Funded by: Fundação Carlos Chagas Filho de Amparo à Pesquisa do Estado do Rio de Janeiro, doi 10.13039/501100004586;
                Award ID: E-26/203.244/2022
                Funded by: Fundação Carlos Chagas Filho de Amparo à Pesquisa do Estado do Rio de Janeiro, doi 10.13039/501100004586;
                Award ID: E-26/010.000980/2019
                Funded by: Conselho Nacional de Desenvolvimento Científico e Tecnológico, doi 10.13039/501100003593;
                Award ID: 465423/2014-0
                Funded by: Conselho Nacional de Desenvolvimento Científico e Tecnológico, doi 10.13039/501100003593;
                Award ID: 306720/2021-3
                Funded by: Conselho Nacional de Desenvolvimento Científico e Tecnológico, doi 10.13039/501100003593;
                Award ID: 117064/2023-8
                Funded by: Coordenação de Aperfeiçoamento de Pessoal de Nível Superior, doi 10.13039/501100002322;
                Award ID: 88887.368479/2019-00
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