ZnO:Al films deposited by in-line reactive AC magnetron sputtering for a-Si:H thin film solar cells

Sittinger, V.; Ruske, F.; Werner, W.; Szyszka, B.; Rech, B.; Hüpkes, Jürgen; Schöpe, G.; Stiebig, H.

doi:10.1016/j.tsf.2005.08.177

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ZnO:Al films deposited by in-line reactive AC magnetron sputtering for a-Si:H thin film solar cells

Author(s): V. Sittinger , F. Ruske , W. Werner , B. Szyszka , B. Rech , J. Hüpkes , G. Schöpe , H. Stiebig

Publication date Created: February 2006

Publication date (Print): February 2006

Journal: Thin Solid Films

Publisher: Elsevier BV

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Title: Thin Solid Films

Abbreviated Title: Thin Solid Films

Publisher: Elsevier BV

ISSN (Print): 00406090

Publication date Created: February 2006

Publication date (Print): February 2006

Volume: 496

Issue: 1

Pages: 16-25

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DOI: 10.1016/j.tsf.2005.08.177

SO-VID: f5e6383a-8015-436f-a22b-f2656f999e26

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http://www.elsevier.com/tdm/userlicense/1.0/

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ZnO:Al films deposited by in-line reactive AC magnetron sputtering for a-Si:H thin film solar cells

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Silicon thin film solar cells

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