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Active to passive transition in the oxidation of silicon carbide at high temperature and low pressure in molecular and atomic oxygen
Author(s):
M Balat
,
G FLAMANT
,
G Male
,
G Pichelin
,
G Flamant
Publication date:
1992
Journal:
J Mater Sci
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Atomic Force Microscopy
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DOI::
10.1007/BF02403882
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