Blog
About

3,972
views
2
recommends
+1 Recommend
1 collections
    46
    shares
    • Record: found
    • Abstract: found
    • Article: found
    Is Open Access

    Marrying medicine and materials: artemisinin (Qinghaosu) particle is soft enough for scratching hard SiC wafer in water

    Read this article at

    Bookmark
        There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.

        Abstract

        Silicon carbide (SiC) single crystals, along with sapphire and silicon, are one of the most important substrates for high-brightness light-emitting diode fabrications. Owing to extremely high hardness (Mohs’ scale of 9.5) and chemical inertness, the polishing rate of SiC with conventional chemical mechanical polishing methods is not high, and surface scratches are also inevitable because of using slurry containing hard abrasives such as silica particles. Here artemisinin (Qinghaosu) crystals, very soft molecular solids, were found, for the first time to the best of our knowledge, to effectively polish SiC wafers even in pure water as demonstrated by proof-of-concept scratching experiments using atomic force microscopy. The underlying mechanism is attributed to activated oxidation of SiC by mechanically released reactive · OH free radicals from the endoperoxide bridges. The preliminary results reported here have important implications for developing novel alternative green and scratch-free polishing methods for hard-brittle substrates including SiC, diamond, and others.

        Related collections

        Most cited references 26

        • Record: found
        • Abstract: not found
        • Article: not found

        The discovery of artemisinin (qinghaosu) and gifts from Chinese medicine.

         Y. Tu (2011)
          Bookmark
          • Record: found
          • Abstract: not found
          • Article: not found

          Hybrid polishing mechanism of single crystal SiC using mixed abrasive slurry (MAS)

           H.S. Lee,  D.I. Kim,  J.H. An (2010)
            Bookmark
            • Record: found
            • Abstract: not found
            • Article: not found

            Catalyst-referred etching of 4H-SiC substrate utilizing hydroxyl radicals generated from hydrogen peroxide molecules

             K Yagi,  J. MURATA,  A Kubota (2008)
              Bookmark

              Author and article information

              Affiliations
              [1 ]School of Chemical Engineering and Technology, Harbin Institute of Technology, Harbin 150001, China
              [2 ]School of Mechanical Engineering, Harbin Institute of Technology, Harbin 150001, China
              Author notes
              [* ]Corresponding author’s e-mail address: ygan@ 123456hit.edu.cn
              Contributors
              Journal
              SOR-MATSCI
              ScienceOpen Research
              ScienceOpen
              2199-1006
              27 January 2016
              : 0 (ID: 0d3cb971-575c-4a49-9022-bb549b69f9b5 )
              : 0
              : 1-7
              3528:XE
              10.14293/S2199-1006.1.SOR-MATSCI.AMNMZS.v1
              © 2016 Zhu et al.

              This work has been published open access under Creative Commons Attribution License CC BY 4.0 , which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. Conditions, terms of use and publishing policy can be found at www.scienceopen.com .

              Counts
              Figures: 3, Tables: 0, References: 27, Pages: 7
              Product
              Categories
              Original article
              ScienceOpen disciplines:
              Keywords:

              Comments

              Comment on this article