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Metrology of LER: influence of line-edge roughness (LER) on transistor performance
Author(s):
Atsuko Yamaguchi
,
Katsuhiko Ichinose
,
Satoshi Shimamoto
,
Hiroshi Fukuda
,
Ryuta Tsuchiya
,
Kazuhiro Ohnishi
,
Hiroki Kawada
,
Takashi Iizumi
Publication date:
2004
Journal:
Metrology, Inspection, and Process Control for Microlithography XVIII
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Embodied Memory
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DOI::
10.1117/12.534631
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