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      Nitrogen Buffering Effect on Oxygen in Indium-Tin-Oxide-Capped Resistive Random Access Memory With NH<sub>3</sub> Treatment

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          Author and article information

          Journal
          IEEE Electron Device Letters
          IEEE Electron Device Lett.
          Institute of Electrical and Electronics Engineers (IEEE)
          0741-3106
          1558-0563
          November 2015
          November 2015
          : 36
          : 11
          : 1138-1141
          Article
          10.1109/LED.2015.2477163
          081db2f1-a8fd-42d4-a0bb-528145fdd7d1
          © 2015
          History

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