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      Charging effect induced by electron beam irradiation: a review

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          ABSTRACT

          Charging effect frequently occurs when characterizing nonconductive materials using electrons as probes and/or signals and can impede the acquisition of useful information about the material under investigation. It is not adequate to investigate it merely by experiments, but theoretical investigations, for which the Monte Carlo method is a suitable tool, are also necessary. In this paper we review Monte Carlo simulations and selected experiments, intending to provide general insight into the charging effects induced by electron beam irradiation. We will introduce categories of the charging effect, the theoretical framework that is adopted in Monte Carlo modeling of the charging effect and present some typical simulation results. At last, with the knowledge on charging effect imparted by the above contents, we will discuss the measures that can be used for minimizing it.

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          Most cited references158

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          The Scattering of Fast Electrons by Atomic Nuclei

          N. F. Mott (1929)
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            Electron mean-free-path calculations using a model dielectric function

            David Penn (1987)
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              Calculations of electron inelastic mean free paths for 31 materials

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                Author and article information

                Journal
                Sci Technol Adv Mater
                Sci Technol Adv Mater
                Science and Technology of Advanced Materials
                Taylor & Francis
                1468-6996
                1878-5514
                11 November 2021
                2021
                11 November 2021
                : 22
                : 1
                : 932-971
                Affiliations
                [a ]Department of Physics and Hefei National Laboratory for Physical Sciences at Microscale, University of Science and Technology of China; , Hefei, People’s Republic of China
                [b ]Research and Services Division of Materials Data and Integrated System, National Institute for Materials Science; , Tsukuba, Japan
                [c ]Research Center for Advanced Measurement and Characterization, National Institute for Materials Science; , Tsukuba, Japan
                [d ]Research Center for Functional Materials, National Institute for Materials Science; , Tsukuba, Japan
                Author notes
                CONTACT Bo Da DA.Bo@ 123456nims.go.jp Research and Services Division of Materials Data and Integrated System, National Institute for Materials Science; , 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
                Z.J. Ding zjding@ 123456ustc.edu.cn Department of Physics and Hefei National Laboratory for Physical Sciences at Microscale, University of Science and Technology of China; , Hefei, Anhui 230026, People’s Republic of China
                Author information
                https://orcid.org/0000-0001-5767-1145
                https://orcid.org/0000-0003-3560-7040
                https://orcid.org/0000-0002-0785-8662
                https://orcid.org/0000-0003-2580-7401
                Article
                1976597
                10.1080/14686996.2021.1976597
                8592625
                183bc590-6252-45a4-830b-3b810e7fd545
                © 2021 The Author(s). Published by National Institute for Materials Science in partnership with Taylor & Francis Group.

                This is an Open Access article distributed under the terms of the Creative Commons Attribution License ( http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

                History
                Page count
                Figures: 29, Tables: 1, References: 158, Pages: 40
                Categories
                Review Article
                New topics/Others

                charging effect,monte carlo,experiment,electron beam irradiation,70 new topics/others,202 dielectrics / piezoelectrics / insulators,212 surface and interfaces,502 electron spectroscopy

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