ScienceOpen:
research and publishing network
For Publishers
Discovery
Metadata
Peer review
Hosting
Publishing
For Researchers
Join
Publish
Review
Collect
My ScienceOpen
Sign in
Register
Dashboard
Blog
About
Search
Advanced search
My ScienceOpen
Sign in
Register
Dashboard
Search
Search
Advanced search
For Publishers
Discovery
Metadata
Peer review
Hosting
Publishing
For Researchers
Join
Publish
Review
Collect
Blog
About
0
views
15
references
Top references
cited by
25
Cite as...
0 reviews
Review
0
comments
Comment
0
recommends
+1
Recommend
0
collections
Add to
0
shares
Share
Twitter
Sina Weibo
Facebook
Email
2,114
similar
All similar
Record
: found
Abstract
: not found
Article
: not found
Electronic properties of chemically deposited polycrystalline silicon
Author(s):
M. Hirose
,
M. Taniguchi
,
Y. Osaka
Publication date
Created:
January 1979
Publication date
(Print):
January 1979
Journal:
Journal of Applied Physics
Publisher:
AIP Publishing
Read this article at
ScienceOpen
Publisher
Review
Review article
Invite someone to review
Bookmark
Cite as...
There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.
Related collections
Electronic Workshops in Computing (eWiC)
Most cited references
15
Record
: found
Abstract
: not found
Article
: not found
Structural, Optical, and Electrical Properties of Amorphous Silicon Films
G Pettit
,
R. S. Title
,
M. Brodsky
…
(1970)
0
comments
Cited
163
times
– based on
0
reviews
Review now
Bookmark
Record
: found
Abstract
: not found
Article
: not found
Hall Mobility in Chemically Deposited Polycrystalline Silicon
T Kamins
(1971)
0
comments
Cited
113
times
– based on
0
reviews
Review now
Bookmark
Record
: found
Abstract
: not found
Article
: not found
The temperature dependence f photoconductivity in a-Si
W.E. Spear
,
A.Al-Sharbaty
,
R.J. Loveland
(1974)
0
comments
Cited
60
times
– based on
0
reviews
Review now
Bookmark
All references
Author and article information
Journal
Title:
Journal of Applied Physics
Abbreviated Title:
Journal of Applied Physics
Publisher:
AIP Publishing
ISSN (Print):
0021-8979
ISSN (Electronic):
1089-7550
Publication date Created:
January 1979
Publication date (Print):
January 1979
Volume
: 50
Issue
: 1
Pages
: 377-382
Article
DOI:
10.1063/1.325674
SO-VID:
1aba3b73-ae2c-4035-b81c-e8eb1b593c27
Copyright ©
© 1979
History
Data availability:
Comments
Comment on this article
Sign in to comment
scite_
Similar content
2,114
Development of Polycrystalline Diamond Compatible with the Latest N-Polar GaN mm-Wave Technology
Authors:
Mohamadali Malakoutian
,
Chenhao Ren
,
Kelly Woo
…
Polycrystalline boron-doped diamond electrodes for electrocatalytic and electrosynthetic applications
Authors:
Yasuaki Einaga
,
Tribidasari A Ivandini
Enhancement of lower critical field by reducing the thickness of epitaxial and polycrystalline MgB2 thin films
Authors:
X. Xi
,
Ke Chen
,
L Civale
See all similar
Cited by
25
Determination of gap state density in polycrystalline silicon by field‐effect conductance
Authors:
G Fortunato
,
P Migliorato
A conduction model for semiconductor-grain-boundary-semiconductor barriers in polycrystalline-silicon films
Authors:
Chih-Yuan Lu
,
N.C.-C. Lu
,
L. Gerzberg
…
Theory of conduction in polysilicon: Drift-diffusion approach in crystalline-amorphous-crystalline semiconductor system—Part I: Small signal theory
Authors:
D.M. KIM
,
A.N. Khondker
,
S.S. Ahmed
…
See all cited by
Most referenced authors
76
R. C. Anderson
R. E. ANDERSON
T Klein
See all reference authors