For Publishers
DiscoveryMetadataPeer reviewHostingPublishing
For Researchers
JoinPublishReviewCollect
Register
Blog
About
Search
Advanced search
My ScienceOpen
Search
For Publishers
For Researchers
Blog
About
1
views
0
references
 Top references
cited by
0
    
0 reviews
 Review
0
comments
 Comment
0
recommends
+1 Recommend
0 collections
    0
    shares
      2,317
      similar
       All similar
      • Record: found
      • Abstract: not found
      • Article: not found

      High-density plasma etching of CoFeSiB magnetic films with hard mask

      Author(s): , , ,
      Publication date Created:
      Publication date (Print):
      Journal: Journal of Magnetism and Magnetic Materials
      Publisher: Elsevier BV

      Read this article at

      ScienceOpenPublisher
      Bookmark
          There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.

          Related collections

          Author and article information

          Journal
          Title: Journal of Magnetism and Magnetic Materials
          Abbreviated Title: Journal of Magnetism and Magnetic Materials
          Publisher: Elsevier BV
          ISSN (Print): 03048853
          Publication date Created: September 2006
          Publication date (Print): September 2006
          Volume: 304
          Issue: 1
          Pages: e282-e284
          Article
          DOI: 10.1016/j.jmmm.2006.02.019
          SO-VID: 218e9d56-dc24-4b87-b36d-3962207b338f
          Copyright © © 2006
          License:

          https://www.elsevier.com/tdm/userlicense/1.0/

          History

          Data availability:

          Comments

          Comment on this article