Warpage of Czochralski-Grown Silicon Wafers as Affected by Oxygen Precipitation

Kakui, Yoshiharu; Shimizu, Hirofumi; Watanabe, Tetsuo

doi:10.1143/JJAP.24.815

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Warpage of Czochralski-Grown Silicon Wafers as Affected by Oxygen Precipitation

Author(s): Hirofumi Shimizu , Tetsuo Watanabe , Yoshiharu Kakui

Publication date Created: July 20 1985

Publication date (Print): July 20 1985

Journal: Japanese Journal of Applied Physics

Publisher: Japan Society of Applied Physics

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Journal ID (publisher-id): JAPNDE

Title: Japanese Journal of Applied Physics

Abbreviated Title: Jpn. J. Appl. Phys.

Publisher: Japan Society of Applied Physics

ISSN (Print): 0021-4922

ISSN (Electronic): 1347-4065

Publication date Created: July 20 1985

Publication date (Print): July 20 1985

Volume: 24

Issue: Part 1, No. 7

Pages: 815-821

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DOI: 10.1143/JJAP.24.815

SO-VID: 220dcffd-51c5-49a5-9265-f3d6abe5fde4

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