- Record: found
- Abstract: not found
- Article: not found
Zr–Ti–Ni thin film metallic glass as a diffusion barrier between copper and silicon
Read this article at
ScienceOpenPublisher
There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.
Related collections
Most cited references33
- Record: found
- Abstract: not found
- Article: not found
Electrical-Resistivity Model for Polycrystalline Films: the Case of Arbitrary Reflection at External Surfaces
A. F. Mayadas, M. Shatzkes (1970)
- Record: found
- Abstract: not found
- Article: not found
Formation of an Amorphous Alloy by Solid-State Reaction of the Pure Polycrystalline Metals
R. Schwarz, W. L. Johnson (1983)
- Record: found
- Abstract: not found
- Article: not found
Crystallization of germanium–antimony–tellurium amorphous thin film sandwiched between various dielectric protective films
Norikazu Ohshima (1996)