Step and flash imprint lithography: Template surface treatment and defect analysis

Meissl, M.; Shaya, S; Ekerdt, J. G.; Sreenivasan, S V; Willson, C. G.; Bailey, T.; Choi, B. J.; Colburn, M.

doi:10.1116/1.1324618

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Step and flash imprint lithography: Template surface treatment and defect analysis

Author(s): T. Bailey , B. J. Choi , M. Colburn , M. Meissl , S. Shaya , J. G. Ekerdt , S. V. Sreenivasan , C. G. Willson

Publication date Created: 2000

Publication date (Print): 2000

Journal: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Publisher: American Vacuum Society

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The Lowest Surface Free Energy Based on −CF3Alignment

Katsuhiko Nakamae, Yasukiyo Ueda, Takashi Nishino … (1999)

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Mold-assisted nanolithography: A process for reliable pattern replication

Jan Haisma (1996)

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CONSTITUTIVE RELATIONS IN THE WETTING OF LOW ENERGY SURFACES AND THE THEORY OF THE RETRACTION METHOD OF PREPARING MONOLAYERS1

Elaine Shafrin, William A. Zisman (1960)

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Journal ID (publisher-id): JVTBD9

Title: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Abbreviated Title: J. Vac. Sci. Technol. B

Publisher: American Vacuum Society

ISSN (Print): 0734211X

Publication date Created: 2000

Publication date (Print): 2000

Volume: 18

Issue: 6

Page: 3572

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DOI: 10.1116/1.1324618

SO-VID: 6e5bf947-bbc5-4f81-a062-2d267b5c266b

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Step and flash imprint lithography: Template surface treatment and defect analysis

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Core Readings in Statistical Mediation Analysis

Most cited references 14

The Lowest Surface Free Energy Based on −CF3Alignment

Mold-assisted nanolithography: A process for reliable pattern replication

CONSTITUTIVE RELATIONS IN THE WETTING OF LOW ENERGY SURFACES AND THE THEORY OF THE RETRACTION METHOD OF PREPARING MONOLAYERS1

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