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      Enhanced Surface Passivation of Subnanometer Silicon Dioxide Films by Superacidic Treatments

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          Improved quantitative description of Auger recombination in crystalline silicon

          Stefan W. Glunz, Florian Werner, Jan Schmidt … (2012)
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            Growth of native oxide on a silicon surface

            M Kawakami, E Hasegawa, T Ohmi … (1990)
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              Impact of illumination level and oxide parameters on Shockley–Read–Hall recombination at the Si‐SiO2interface

              Armin Aberle, Stefan W. Glunz, Wilhelm Warta (1992)
              Article 0 comments Cited 102 times – based on 0 reviews     Review now
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                Author and article information

                Contributors
                Nicholas E. Grant: (View ORCID Profile)
                Sophie L. Pain: (View ORCID Profile)
                John D. Murphy: (View ORCID Profile)
                Journal
                Title: ACS Applied Energy Materials
                Abbreviated Title: ACS Appl. Energy Mater.
                Publisher: American Chemical Society (ACS)
                ISSN (Print): 2574-0962
                ISSN (Electronic): 2574-0962
                Publication date Created: February 28 2022
                Publication date (Electronic): January 24 2022
                Publication date (Print): February 28 2022
                Volume: 5
                Issue: 2
                Pages: 1542-1550
                Affiliations
                [1 ]School of Engineering, University of Warwick, Coventry CV4 7AL, United Kingdom
                [2 ]Department of Chemistry, University of Warwick, Coventry CV4 7AL, United Kingdom
                [3 ]Department of Physics, University of Warwick, Coventry CV4 7AL, United Kingdom
                Article
                DOI: 10.1021/acsaem.1c02935
                SO-VID: 7bfe99f5-c4ba-40b2-acb1-08cf7a46adea
                Copyright © © 2022
                License:

                https://creativecommons.org/licenses/by/4.0/

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