Forming sub-45-nm high-aspect circle-symmetric spots with double bowtie aperture combined with metal-insulator-metal structure

Li, Ling H.; Liu, Yunyue; Huang, Yuerong; Liu, Xianchao; Chen, Weidong; Zheng, Jie; Xie, Zhengwei

doi:10.1016/j.apsusc.2018.03.224

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Forming sub-45-nm high-aspect circle-symmetric spots with double bowtie aperture combined with metal-insulator-metal structure

Author(s): Jie Zheng , Weidong Chen , Xianchao Liu , Yuerong Huang , Yunyue Liu , Ling Li , Zhengwei Xie

Publication date Created: July 2018

Publication date (Print): July 2018

Journal: Applied Surface Science

Publisher: Elsevier BV

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Title: Applied Surface Science

Abbreviated Title: Applied Surface Science

Publisher: Elsevier BV

ISSN (Print): 01694332

Publication date Created: July 2018

Publication date (Print): July 2018

Volume: 447

Pages: 300-306

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DOI: 10.1016/j.apsusc.2018.03.224

SO-VID: 7df9d3f2-88eb-4ab5-8f3d-d94f58545ec0

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Forming sub-45-nm high-aspect circle-symmetric spots with double bowtie aperture combined with metal-insulator-metal structure

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