- Record: found
- Abstract: not found
- Article: not found
Compatibility of polycrystalline silicon gate deposition with HfO2 and Al2O3/HfO2 gate dielectrics
D. C. Gilmer ,
R. Hegde ,
R. Cotton ,
R. Garcia ,
V. Dhandapani ,
D. Triyoso ,
D. Roan ,
A. Franke ,
R. Rai ,
L. Prabhu ,
C. Hobbs ,
J. M. Grant ,
L. La ,
S. Samavedam ,
B. Taylor ,
H. Tseng ,
P. Tobin
August 12 2002
August 12 2002
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Dielectric functions and optical bandgaps of high-K dielectrics for metal-oxide-semiconductor field-effect transistors by far ultraviolet spectroscopic ellipsometry
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Ultrathin high-K metal oxides on silicon: processing, characterization and integration issues
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