11
views
0
recommends
+1 Recommend
0 collections
    0
    shares
      • Record: found
      • Abstract: found
      • Article: found
      Is Open Access

      The Effects of UV Light on the Chemical and Mechanical Properties of a Transparent Epoxy-Diamine System in the Presence of an Organic UV Absorber

      research-article

      Read this article at

      Bookmark
          There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.

          Abstract

          Despite several excellent properties including low shrinkage, good chemical resistance, curable at low temperatures and the absence of byproducts or volatiles, epoxy resins are susceptible to ultra violet (UV) damage and their durability is reduced substantially when exposed to outdoor environments. To overcome this drawback, UV absorbers have been usually used to decrease the rate of UV degradation. In this present study, the effects of UV light on the chemical, mechanical and physical properties of cured epoxy structure, as well as the effect of an organic UV absorber, Tinuvin 1130, on the epoxy properties were investigated. Chemical changes in a cured epoxy system as a result of the presence and absence of Tinuvin 1130 were determined using Fourier transform infrared spectroscopy (FT-IR) analyses. The effect of Tinuvin 1130 on the surface morphology of the epoxy systems was also investigated by scanning electron microscopy (SEM) imaging. Additionally, the glass transition temperatures ( T g) before and during UV radiation were measured. After an 800 h UV radiation, mechanical test results revealed that the lack of the UV absorber can lead to a ~30% reduction in tensile strength. However, in the presence of Tinuvin 1130, the tensile strength was reduced only by ~11%. It was hypothesized that the use of Tinuvin 1130, as an organic UV absorber in the epoxy-amine system, could decrease the undesirable effects, arising from exposure to UV light.

          Related collections

          Most cited references52

          • Record: found
          • Abstract: found
          • Article: found
          Is Open Access

          Photodegradation and photostabilization of polymers, especially polystyrene: review

          Exposure to ultraviolet (UV) radiation may cause the significant degradation of many materials. UV radiation causes photooxidative degradation which results in breaking of the polymer chains, produces free radical and reduces the molecular weight, causing deterioration of mechanical properties and leading to useless materials, after an unpredictable time. Polystyrene (PS), one of the most important material in the modern plastic industry, has been used all over the world, due to its excellent physical properties and low-cost. When polystyrene is subjected to UV irradiation in the presence of air, it undergoes a rapid yellowing and a gradual embrittlement. The mechanism of PS photolysis in the solid state (film) depends on the mobility of free radicals in the polymer matrix and their bimolecular recombination. Free hydrogen radicals diffuse very easily through the polymer matrix and combine in pairs or abstract hydrogen atoms from polymer molecule. Phenyl radical has limited mobility. They may abstract hydrogen from the near surrounding or combine with a polymer radical or with hydrogen radicals. Almost all synthetic polymers require stabilization against adverse environmental effects. It is necessary to find a means to reduce or prevent damage induced by environmental components such as heat, light or oxygen. The photostabilization of polymers may be achieved in many ways. The following stabilizing systems have been developed, which depend on the action of stabilizer: (1) light screeners, (2) UV absorbers, (3) excited-state quenchers, (4) peroxide decomposers, and (5) free radical scavengers; of these, it is generally believed that excited-state quenchers, peroxide decomposers, and free radical scavengers are the most effective. Research into degradation and ageing of polymers is extremely intensive and new materials are being synthesized with a pre-programmed lifetime. New stabilizers are becoming commercially available although their modes of action are sometimes not thoroughly elucidated. They target the many possible ways of polymer degradation: thermolysis, thermooxidation, photolysis, photooxidation, radiolysis etc. With the goal to increase lifetime of a particular polymeric material, two aspects of degradation are of particular importance: Storage conditions, and Addition of appropriate stabilizers. A profound knowledge of degradation mechanisms is needed to achieve the goal.
            Bookmark
            • Record: found
            • Abstract: found
            • Article: not found

            Effects of ultraviolet light (315 nm), temperature and relative humidity on the degradation of polylactic acid plastic films.

            The influence of temperature (30, 45 and 60 degrees C) and relative humidity (RH) (30%, 50% and 100%) on the degradation of poly(l-lactic acid) (PLA) films were studied. In addition, the effects of ultraviolet (UV) light (315 nm) on the degradation of PLA films were also analyzed. Various analytical techniques were applied to observe changes in the properties of PLA polymer films. FTIR spectroscopy was used as semi-quantitative method to get information about the chemistry of the degradative process. The degradation rate of PLA was enhanced by increasing temperature and RH, factors responsible for a faster reduction of the weight-average molecular weight (M(W)), of the glass transition temperature (Tg) and of the percentage of elongation at break. Moreover, UV treatment accelerated these phenomena.
              Bookmark
              • Record: found
              • Abstract: not found
              • Article: not found

              Photostability of sunscreens

                Bookmark

                Author and article information

                Contributors
                Role: Academic Editor
                Journal
                Materials (Basel)
                Materials (Basel)
                materials
                Materials
                MDPI
                1996-1944
                14 February 2017
                February 2017
                : 10
                : 2
                : 180
                Affiliations
                [1 ]Department of Applied Chemistry, Faculty of Chemistry, University of Tabriz, Tabriz 51666, Iran; s_nikafshar@ 123456yahoo.com (S.N.); a.mirmohseni@ 123456hotmail.com (A.M.)
                [2 ]Institute for Frontier Materials, Deakin University, Geelong, Burwood, VIC 3125, Australia
                [3 ]Department of Chemical Engineering, Isfahan University of Technology, Isfahan 84156/83111, Iran; mojtaba.ahmadi@ 123456ce.iut.ac.ir
                [4 ]School of Physical, Environmental & Mathematical Sciences, UNSW, Canberra, ACT 2610, Australia; m_taseidifar@ 123456yahoo.com
                Author notes
                [* ]Correspondence: ozabihi@ 123456deakin.edu.au (O.Z.); minoo.naebe@ 123456deakin.edu.au (M.N.); Tel.: +61-4-6957-0372 (O.Z.); +61-3-5227-1410 (M.N.)
                Article
                materials-10-00180
                10.3390/ma10020180
                5459211
                28772538
                bf99ade5-06d0-4705-94d0-b2185e4bdf87
                © 2017 by the authors.

                Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license ( http://creativecommons.org/licenses/by/4.0/).

                History
                : 16 December 2016
                : 03 February 2017
                Categories
                Article

                epoxy resin,uv absorber,photodegradation process,tinuvin 1130

                Comments

                Comment on this article