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      Topotaxial growth of Ti2AlN by solid state reaction in AlN∕Ti(0001) multilayer thin films

      , , , , ,
      Applied Physics Letters
      AIP Publishing

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          The MN+1AXN phases: A new class of solids

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            Thermal stability of nitride thin films

            L Hultman (2000)
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              Magnetron sputtered epitaxial single-phase Ti3SiC2 thin films

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                Author and article information

                Journal
                Applied Physics Letters
                Appl. Phys. Lett.
                AIP Publishing
                0003-6951
                1077-3118
                April 23 2007
                April 23 2007
                : 90
                : 17
                : 174106
                Article
                10.1063/1.2731520
                c9fc9bf7-6356-4a07-a656-cfb05632cd42
                © 2007
                History

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