10
views
0
recommends
+1 Recommend
0 collections
    0
    recommends
      • Record: found
      • Abstract: not found
      • Article: not found

      Transitions between channel and contact regimes of low-frequency noise in many-layer MoS2 field effect transistors

      Read this article at

      ScienceOpenPublisher
      Bookmark
          There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.

          Related collections

          Most cited references20

          • Record: found
          • Abstract: found
          • Article: not found

          High performance multilayer MoS2 transistors with scandium contacts.

          While there has been growing interest in two-dimensional (2-D) crystals other than graphene, evaluating their potential usefulness for electronic applications is still in its infancy due to the lack of a complete picture of their performance potential. The focus of this article is on contacts. We demonstrate that through a proper understanding and design of source/drain contacts and the right choice of number of MoS(2) layers the excellent intrinsic properties of this 2-D material can be harvested. Using scandium contacts on 10-nm-thick exfoliated MoS(2) flakes that are covered by a 15 nm Al(2)O(3) film, high effective mobilities of 700 cm(2)/(V s) are achieved at room temperature. This breakthrough is largely attributed to the fact that we succeeded in eliminating contact resistance effects that limited the device performance in the past unrecognized. In fact, the apparent linear dependence of current on drain voltage had mislead researchers to believe that a truly Ohmic contact had already been achieved, a misconception that we also elucidate in the present article.
            Bookmark
            • Record: found
            • Abstract: found
            • Article: not found

            Fermi Level Pinning at Electrical Metal Contacts of Monolayer Molybdenum Dichalcogenides.

            Electrical metal contacts to two-dimensional (2D) semiconducting transition metal dichalcogenides (TMDCs) are found to be the key bottleneck to the realization of high device performance due to strong Fermi level pinning and high contact resistances (Rc). Until now, Fermi level pinning of monolayer TMDCs has been reported only theoretically, although that of bulk TMDCs has been reported experimentally. Here, we report the experimental study on Fermi level pinning of monolayer MoS2 and MoTe2 by interpreting the thermionic emission results. We also quantitatively compared our results with the theoretical simulation results of the monolayer structure as well as the experimental results of the bulk structure. We measured the pinning factor S to be 0.11 and -0.07 for monolayer MoS2 and MoTe2, respectively, suggesting a much stronger Fermi level pinning effect, a Schottky barrier height (SBH) lower than that by theoretical prediction, and interestingly similar pinning energy levels between monolayer and bulk MoS2. Our results further imply that metal work functions have very little influence on contact properties of 2D-material-based devices. Moreover, we found that Rc is exponentially proportional to SBH, and these processing parameters can be controlled sensitively upon chemical doping into the 2D materials. These findings provide a practical guideline for depinning Fermi level at the 2D interfaces so that polarity control of TMDC-based semiconductors can be achieved efficiently.
              Bookmark
              • Record: found
              • Abstract: not found
              • Article: not found

              The indirect to direct band gap transition in multilayered MoS2 as predicted by screened hybrid density functional theory

                Bookmark

                Author and article information

                Journal
                Applied Physics Letters
                Appl. Phys. Lett.
                AIP Publishing
                0003-6951
                1077-3118
                March 18 2019
                March 18 2019
                : 114
                : 11
                : 113502
                Affiliations
                [1 ]School of Electrical and Computer Engineering, Purdue University, West Lafayette, Indiana 47907, USA
                [2 ]Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47907, USA
                [3 ]Sandia National Laboratories, Albuquerque, New Mexico 87185, USA
                [4 ]Department of Industrial and Manufacturing Systems Engineering, Kansas State University, Manhattan, Kansas 66506, USA
                [5 ]Department of Electrical and Computer Engineering, Kansas State University, Manhattan, Kansas 66506, USA
                Article
                10.1063/1.5063501
                f4f97e0e-e936-468f-ad80-243e95fc6a2b
                © 2019

                https://publishing.aip.org/authors/rights-and-permissions

                History

                Comments

                Comment on this article