Water-Erasable Memory Device for Security Applications Prepared by the Atomic Layer Deposition of GeO2

There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.

Related collections

Author and article information

Journal

Title: Chemistry of Materials

Abbreviated Title: Chem. Mater.

Publisher: American Chemical Society (ACS)

ISSN (Print): 0897-4756

ISSN (Electronic): 1520-5002

Publication date Created: January 30 2018

Publication date Created: February 13 2018

Publication date (Electronic): January 30 2018

Publication date (Print): February 13 2018

Volume: 30

Issue: 3

Pages: 830-840

Affiliations

[1 ]Department of Material Science Engineering, Incheon National University, Incheon 22012, Korea

[2 ]Innovation Center for Chemical Engineering, Incheon National University, Incheon 22012, Korea

[3 ]Energy Plant R&D Group, Korea Institute of Industrial Technology (KITECH), Busan 46938, Korea

[4 ]Department of Chemical Engineering, Hongik University, Seoul 04066, Korea

Article

DOI: 10.1021/acs.chemmater.7b04371

SO-VID: f5ae4dbc-007c-4840-848f-54200d8e48af

History

Data availability:

Comments

Comment on this article

scite_

Cited by 2

See all cited by