Review of 'Marrying Medicine and Materials: Artemisinin (Qinghaosu) Particle is Soft Enough for Scratching Hard SiC Wafer in Water'

In general, this is a well written and interesting article which needs to be published. In this work, the authors presented a novel method for polishing SiC wafers effectively even in pure water using artemisinin (Qinghaosu) crystals. AFM was employed to conduct scratching tests to demonstrate the polishing mechanism of this proposed method. However, there are a few minor issues to be addressed.

1. In the section of “AFM scratching test using artemisinin-modified AFM probe in water”, “in water (with a quartz liquid cell)” (5th lines of this section) is better to be defined as “de-ionized water”.
2. In the same section, the resolution of each scratching test (such as 256×256 or 512×512) should be given.
3. In the first sentence of Page 3, the word “and” (NaOH and H₂SO₄) should be changed into “or”.
4. In Fig. 2 (c), the horizontal axis of Line 2 should be “y (μm)”.
5. In the section of “Mechanism discussion: decomposition of SiC mediated by mechanically activated OH free radicals in water”, I think more discussions of mechanical-chemical effects on the machining process could be considered.