Microstructure evolution of hydrogen-implanted silicon during the annealing process

WANG, Jing; Xiao, Qinghua; Tu, Hailing; Shao, Beiling; Liu, Ansheng

doi:10.1016/S0167-9317(02)00924-3

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Microstructure evolution of hydrogen-implanted silicon during the annealing process

Author(s): Jing Wang , Qinghua Xiao , Hailing Tu , Beiling Shao , Ansheng Liu

Publication date Created: April 2003

Publication date (Print): April 2003

Journal: Microelectronic Engineering

Publisher: Elsevier BV

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Title: Microelectronic Engineering

Abbreviated Title: Microelectronic Engineering

Publisher: Elsevier BV

ISSN (Print): 01679317

Publication date Created: April 2003

Publication date (Print): April 2003

Volume: 66

Issue: 1-4

Pages: 314-319

Article

DOI: 10.1016/S0167-9317(02)00924-3

SO-VID: 159d33d0-8cc0-4e31-8e81-86c9a05de202

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http://www.elsevier.com/tdm/userlicense/1.0/

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Microstructure evolution of hydrogen-implanted silicon during the annealing process

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