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      Mechanism of Resist Pattern Collapse during Development Process

      Author(s): , ,
      Publication date Created:
      Publication date (Print):
      Journal: Japanese Journal of Applied Physics
      Publisher: Japan Society of Applied Physics

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          Journal
          Journal ID (publisher-id): JAPNDE
          Title: Japanese Journal of Applied Physics
          Abbreviated Title: Jpn. J. Appl. Phys.
          Publisher: Japan Society of Applied Physics
          ISSN (Print): 0021-4922
          ISSN (Electronic): 1347-4065
          Publication date Created: December 30 1993
          Publication date (Print): December 30 1993
          Volume: 32
          Issue: Part 1, No. 12B
          Pages: 6059-6064
          Article
          DOI: 10.1143/JJAP.32.6059
          SO-VID: 233ffa52-b2b4-4b9e-b7d7-98092d4bb2eb
          Copyright © © 1993
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