0
views
0
recommends
+1 Recommend
0 collections
    0
    shares
      • Record: found
      • Abstract: found
      • Article: found
      Is Open Access

      High-κ Wide-Gap Layered Dielectric for Two-Dimensional van der Waals Heterostructures

      research-article

      Read this article at

      Bookmark
          There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.

          Abstract

          van der Waals heterostructures of two-dimensional materials have unveiled frontiers in condensed matter physics, unlocking unexplored possibilities in electronic and photonic device applications. However, the investigation of wide-gap, high-κ layered dielectrics for devices based on van der Waals structures has been relatively limited. In this work, we demonstrate an easily reproducible synthesis method for the rare-earth oxyhalide LaOBr, and we exfoliate it as a 2D layered material with a measured static dielectric constant of 9 and a wide bandgap of 5.3 eV. Furthermore, our research demonstrates that LaOBr can be used as a high-κ dielectric in van der Waals field-effect transistors with high performance and low interface defect concentrations. Additionally, it proves to be an attractive choice for electrical gating in excitonic devices based on 2D materials. Our work demonstrates the versatile realization and functionality of 2D systems with wide-gap and high-κ van der Waals dielectric environments.

          Related collections

          Most cited references44

          • Record: found
          • Abstract: not found
          • Article: not found

          VESTA 3for three-dimensional visualization of crystal, volumetric and morphology data

            Bookmark
            • Record: found
            • Abstract: found
            • Article: not found

            Electronics and optoelectronics of two-dimensional transition metal dichalcogenides.

            The remarkable properties of graphene have renewed interest in inorganic, two-dimensional materials with unique electronic and optical attributes. Transition metal dichalcogenides (TMDCs) are layered materials with strong in-plane bonding and weak out-of-plane interactions enabling exfoliation into two-dimensional layers of single unit cell thickness. Although TMDCs have been studied for decades, recent advances in nanoscale materials characterization and device fabrication have opened up new opportunities for two-dimensional layers of thin TMDCs in nanoelectronics and optoelectronics. TMDCs such as MoS(2), MoSe(2), WS(2) and WSe(2) have sizable bandgaps that change from indirect to direct in single layers, allowing applications such as transistors, photodetectors and electroluminescent devices. We review the historical development of TMDCs, methods for preparing atomically thin layers, their electronic and optical properties, and prospects for future advances in electronics and optoelectronics.
              Bookmark
              • Record: found
              • Abstract: not found
              • Article: not found

              2D materials and van der Waals heterostructures

                Bookmark

                Author and article information

                Journal
                ACS Nano
                ACS Nano
                nn
                ancac3
                ACS Nano
                American Chemical Society
                1936-0851
                1936-086X
                01 April 2024
                16 April 2024
                : 18
                : 15
                : 10397-10406
                Affiliations
                []Department of Inorganic Chemistry, University of Chemistry and Technology Prague , Technicka 5, 166 28, Prague 6, Czech Republic
                []Institute of Electrical and Microengineering, École Polytechnique Fédérale de Lausanne (EPFL) , CH-1015 Lausanne, Switzerland
                [§ ]Institute of Materials Science and Engineering, École Polytechnique Fédérale de Lausanne (EPFL) , CH-1015 Lausanne, Switzerland
                []Institute of Physics of the Czech Academy of Sciences , v.v.i., Cukrovarnická 10, 162 00, Prague 6, Czech Republic
                []Institute of Microelectronics, TU Wien , Gußhausstraße 27−29, 1040 Vienna, Austria
                []Institute of Applied Physics, TU Wien , Wiedner Hauptstraße 8−10, 1040 Vienna, Austria
                Author notes
                Author information
                https://orcid.org/0000-0001-8975-413X
                https://orcid.org/0000-0001-9076-5389
                https://orcid.org/0000-0002-3779-7258
                https://orcid.org/0000-0002-5149-7307
                https://orcid.org/0000-0003-3570-5337
                https://orcid.org/0000-0003-1357-396X
                https://orcid.org/0000-0003-0319-5256
                https://orcid.org/0000-0002-3426-7702
                https://orcid.org/0000-0002-1391-4448
                Article
                10.1021/acsnano.3c10411
                11025129
                38557003
                5d189820-cca1-4527-8b25-c49e0e5d54c7
                © 2024 The Authors. Published by American Chemical Society

                Permits the broadest form of re-use including for commercial purposes, provided that author attribution and integrity are maintained ( https://creativecommons.org/licenses/by/4.0/).

                History
                : 23 October 2023
                : 20 March 2024
                : 13 March 2024
                Funding
                Funded by: H2020 European Research Council, doi 10.13039/100010663;
                Award ID: 101055379
                Funded by: Vysoká Škola Chemicko-technologická v Praze, doi 10.13039/501100016367;
                Award ID: A2_FCHT_2023_105
                Funded by: Vysoká Škola Chemicko-technologická v Praze, doi 10.13039/501100016367;
                Award ID: A2_FCHT_2023_096
                Funded by: Austrian Science Fund, doi 10.13039/501100002428;
                Award ID: NA
                Funded by: Grantová Agentura Ceské Republiky, doi 10.13039/501100001824;
                Award ID: 24-11465S
                Funded by: Ministerstvo Školství, Mládeže a Telovýchovy, doi 10.13039/501100001823;
                Award ID: LL2101
                Categories
                Article
                Custom metadata
                nn3c10411
                nn3c10411

                Nanotechnology
                dielectric,high-k,two-dimensional materials,crystal synthesis,field-effect transistors,heterostructures,excitons

                Comments

                Comment on this article