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Rapid isothermal processing
Author(s):
R. Singh
Publication date
Created:
April 15 1988
Publication date
(Print):
April 15 1988
Journal:
Journal of Applied Physics
Publisher:
AIP Publishing
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New directions in predictive processing
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272
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The effects of water on oxide and interface trapped charge generation in thermal SiO2films
F. Feigl
,
J. Calise
,
D. DiMaria
…
(1981)
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Diffusion of silicon in gallium arsenide using rapid thermal processing: Experiment and model
James Gibbons
,
Mark E. Greiner
(1984)
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Limited reaction processing: Silicon epitaxy
K Williams
,
J Gibbons
,
C. M. Gronet
(1985)
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Author and article information
Journal
Title:
Journal of Applied Physics
Abbreviated Title:
Journal of Applied Physics
Publisher:
AIP Publishing
ISSN (Print):
0021-8979
ISSN (Electronic):
1089-7550
Publication date Created:
April 15 1988
Publication date (Print):
April 15 1988
Volume
: 63
Issue
: 8
Pages
: R59-R114
Article
DOI:
10.1063/1.340176
SO-VID:
757bb356-d5b2-4c15-8e86-322b61978ed3
Copyright ©
© 1988
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