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      Misfit dislocation dynamics in Si1−xGex/(100) Si: Uncapped alloy layers, buried strained layers, and multiple quantum wells

      Applied Physics Letters
      AIP Publishing

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          Accommodation of Misfit Across the Interface Between Crystals of Semiconducting Elements or Compounds

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            Silicon-germanium base heterojunction bipolar transistors by molecular beam epitaxy

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              Excess stress and the stability of strained heterostructures

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                Author and article information

                Journal
                Applied Physics Letters
                Appl. Phys. Lett.
                AIP Publishing
                0003-6951
                1077-3118
                October 1990
                October 1990
                : 57
                : 14
                : 1434-1436
                Article
                10.1063/1.103457
                930689c3-3e7a-4db9-a0de-5aa081f58a90
                © 1990
                History

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