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      Developing a viable multilayer coating process for extreme ultraviolet lithography reticles

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      Journal: Journal of Micro/Nanolithography, MEMS, and MOEMS
      Publisher: SPIE-Intl Soc Optical Eng

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          Nonspecular x-ray scattering in a multilayer-coated imaging system

          E. M. Gullikson, D. P. Gaines, D. G. Stearns … (1998)
          Article 0 comments Cited 16 times – based on 0 reviews     Review now
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            Smoothing of multilayer x‐ray mirrors by ion polishing

            Eberhard Spiller (1989)
            Article 0 comments Cited 13 times – based on 0 reviews     Review now
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              Determination of the layered structure in Mo/Si multilayers by grazing incidence X-ray reflectometry

              A.E. Yakshin, E.L.G Maas, P.C. Görts … (2000)
              Article 0 comments Cited 9 times – based on 0 reviews     Review now
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                Author and article information

                Journal
                Title: Journal of Micro/Nanolithography, MEMS, and MOEMS
                Abbreviated Title: J. Micro/Nanolith. MEMS MOEMS
                Publisher: SPIE-Intl Soc Optical Eng
                ISSN (Print): 1932-5150
                Publication date Created: January 01 2004
                Publication date (Print): January 01 2004
                Volume: 3
                Issue: 1
                Page: 139
                Article
                DOI: 10.1117/1.1631006
                SO-VID: 9e1911d8-ab20-4b74-ba81-e7c5b5c7c3b5
                Copyright © © 2004
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