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Effects of Postdeposition Annealing on Electrical Properties of Mo-Doped Indium Oxide (IMO) Thin Films Deposited by RF Magnetron Cosputtering
Author(s):
N Yamada
,
T Tatejima
,
H Ishizaki
,
T Nakada
,
Naoomi Yamada
,
Tsukasa Tatejima
,
Hiroki Ishizaki
,
Tokio Nakada
,
N. YAMADA
,
H. ISHIZAKI
Publication date:
2006
Journal:
Japanese Journal of Applied Physics
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DOI::
10.1143/JJAP.45.L1179
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