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Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection
Author(s):
Yow-Gwo Wang
,
Ryan Miyakawa
,
Weilun Chao
,
Markus Benk
,
Antoine Wojdyla
,
Alex Donoghue
,
David. Johnson
,
Kenneth Y. Goldberg
,
Andy Neureuther
,
Ted Liang
,
Patrick Naulleau
Publication date:
2015
Journal:
Extreme Ultraviolet (EUV) Lithography VI
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Electron Channelling Contrast Imaging (ECCI)
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DOI::
10.1117/12.2087532
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