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      Growth of single‐crystal CoSi2on Si(111)

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      Applied Physics Letters
      AIP Publishing

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          Refractory silicides for integrated circuits

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            Double heteroepitaxy in the Si (111)/CoSi2/Si structure

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              Silicon/metal silicide heterostructures grown by molecular beam epitaxy

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                Author and article information

                Journal
                Applied Physics Letters
                Appl. Phys. Lett.
                AIP Publishing
                0003-6951
                1077-3118
                April 15 1982
                April 15 1982
                : 40
                : 8
                : 684-686
                Article
                10.1063/1.93234
                af835462-292d-4e8f-b07e-2a3bc9ddc681
                © 1982
                History

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