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      Dose dependence in the laser annealing of arsenic‐implanted silicon

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      Applied Physics Letters
      AIP Publishing

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          Laser annealing of boron‐implanted silicon

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            Author and article information

            Journal
            Applied Physics Letters
            Appl. Phys. Lett.
            AIP Publishing
            0003-6951
            1077-3118
            September 1978
            September 1978
            : 33
            : 5
            : 429-431
            Article
            10.1063/1.90411
            b3a5ee9e-17cc-402f-95ac-35217c449a6b
            © 1978
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