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      High‐Performance and Polarization‐Sensitive Imaging Photodetector Based on WS 2/Te Tunneling Heterostructure

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          Abstract

          Next‐generation imaging systems require photodetectors with high sensitivity, polarization sensitivity, miniaturization, and integration. By virtue of their intriguing attributes, emerging 2D materials offer innovative avenues to meet these requirements. However, the current performance of 2D photodetectors is still below the requirements for practical application owing to the severe interfacial recombination, the lack of photoconductive gain, and insufficient photocarrier collection. Here, a tunneling dominant imaging photodetector based on WS 2/Te heterostructure is reported. This device demonstrates competitive performance, including a remarkable responsivity of 402 A W −1, an outstanding detectivity of 9.28 × 10 13 Jones, a fast rise/decay time of 1.7/3.2 ms, and a high photocurrent anisotropic ratio of 2.5. These outstanding performances can be attributed to the type‐I band alignment with carrier transmission barriers and photoinduced tunneling mechanism, allowing reduced interfacial trapping effect, effective photoconductive gains, and anisotropic collection of photocarriers. Significantly, the constructed photodetector is successfully integrated into a polarized light imaging system and an ultra‐weak light imaging system to illustrate the imaging capability. These results suggest the promising application prospect of the device in future imaging systems.

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          Atomically thin p-n junctions with van der Waals heterointerfaces.

          Semiconductor p-n junctions are essential building blocks for electronic and optoelectronic devices. In conventional p-n junctions, regions depleted of free charge carriers form on either side of the junction, generating built-in potentials associated with uncompensated dopant atoms. Carrier transport across the junction occurs by diffusion and drift processes influenced by the spatial extent of this depletion region. With the advent of atomically thin van der Waals materials and their heterostructures, it is now possible to realize a p-n junction at the ultimate thickness limit. Van der Waals junctions composed of p- and n-type semiconductors--each just one unit cell thick--are predicted to exhibit completely different charge transport characteristics than bulk heterojunctions. Here, we report the characterization of the electronic and optoelectronic properties of atomically thin p-n heterojunctions fabricated using van der Waals assembly of transition-metal dichalcogenides. We observe gate-tunable diode-like current rectification and a photovoltaic response across the p-n interface. We find that the tunnelling-assisted interlayer recombination of the majority carriers is responsible for the tunability of the electronic and optoelectronic processes. Sandwiching an atomic p-n junction between graphene layers enhances the collection of the photoexcited carriers. The atomically scaled van der Waals p-n heterostructures presented here constitute the ultimate functional unit for nanoscale electronic and optoelectronic devices.
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            A biomimetic eye with a hemispherical perovskite nanowire array retina

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              Field-effect transistors made from solution-grown two-dimensional tellurene

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                Author and article information

                Contributors
                (View ORCID Profile)
                Journal
                Small
                Small
                Wiley
                1613-6810
                1613-6829
                April 2023
                January 05 2023
                April 2023
                : 19
                : 15
                Affiliations
                [1 ] Guangdong Provincial Key Laboratory of Information Photonics Technology School of Materials and Energy Guangdong University of Technology Guangzhou Guangdong 510006 P. R. China
                [2 ] College of Science Guangdong University of Petrochemical Technology Maoming Guangdong 525000 P. R. China
                [3 ] School of Semiconductor Science and Technology South China Normal University Foshan Guangdong 528225 P. R. China
                [4 ] State Key Laboratory of Optoelectronic Materials and Technologies Nanotechnology Research Center School of Materials Science and Engineering Sun Yat‐sen University Guangzhou Guangdong 510275 P. R. China
                [5 ] School of Physics and Optoelectronic Engineering Guangdong University of Technology Guangzhou 510006 P. R. China
                [6 ] Guangdong Provincial Key Laboratory of Chip and Integration Technology Guangzhou Guangdong 510631 P. R. China
                Article
                10.1002/smll.202207615
                c1decfd1-83e5-4b8e-acc5-4f0c3b74e4c9
                © 2023

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