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      Facile damage-free double exposure for high-performance 2D semiconductor based transistors

      , , , , , , , ,
      Materials Today Physics
      Elsevier BV

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          Approaching the Schottky–Mott limit in van der Waals metal–semiconductor junctions

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            MoS2 transistors with 1-nanometer gate lengths

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              Mobility engineering and a metal-insulator transition in monolayer MoS₂.

              Two-dimensional (2D) materials are a new class of materials with interesting physical properties and applications ranging from nanoelectronics to sensing and photonics. In addition to graphene, the most studied 2D material, monolayers of other layered materials such as semiconducting dichalcogenides MoS₂ or WSe₂ are gaining in importance as promising channel materials for field-effect transistors (FETs). The presence of a direct bandgap in monolayer MoS₂ due to quantum-mechanical confinement allows room-temperature FETs with an on/off ratio exceeding 10(8). The presence of high- κ dielectrics in these devices enhanced their mobility, but the mechanisms are not well understood. Here, we report on electrical transport measurements on MoS₂ FETs in different dielectric configurations. The dependence of mobility on temperature shows clear evidence of the strong suppression of charged-impurity scattering in dual-gate devices with a top-gate dielectric. At the same time, phonon scattering shows a weaker than expected temperature dependence. High levels of doping achieved in dual-gate devices also allow the observation of a metal-insulator transition in monolayer MoS₂ due to strong electron-electron interactions. Our work opens up the way to further improvements in 2D semiconductor performance and introduces MoS₂ as an interesting system for studying correlation effects in mesoscopic systems.
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                Author and article information

                Journal
                Materials Today Physics
                Materials Today Physics
                Elsevier BV
                25425293
                May 2022
                May 2022
                : 24
                : 100678
                Article
                10.1016/j.mtphys.2022.100678
                d4c35f3c-0c43-4b09-8a52-d7da88b2be94
                © 2022

                https://www.elsevier.com/tdm/userlicense/1.0/

                https://doi.org/10.15223/policy-017

                https://doi.org/10.15223/policy-037

                https://doi.org/10.15223/policy-012

                https://doi.org/10.15223/policy-029

                https://doi.org/10.15223/policy-004

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